14TH INTERNATIONAL SPM WORKSHOP
INTERNATIONAL WORKSHOP ON NEAR-FIELD SCANNING OPTICAL
MICROSCOPY
 
Tuesday, October 22, 1996
8:00 a.m. to 6:00 p.m.
Stanford University
Stanford, California
 
International Workshop On Near-field Scanning Optical Microscopy
Near-field Scanning Optical Microscopy (NSOM) allows the extension of optical
microscopy, spectroscopy, and other photonic techniques beyond the Abbe barrier,
also known as the diffraction limit. Recent advances in Scanning Probe
Microscopy have made NSOM, first postulated in 1925, into a reality.
 
This workshop will showcase new applications and trends in NSOM and allow
in-depth discussion with some of the world's leading practitioners of the
technique.
 
NSOM HAS APPLICATIONS IN ALL AREAS OF SCIENCE
 
Based on classical optical contrast and providing unique information on
electronic
properties of matter, NSOM has potential applications in all areas of research.
Speakers are drawn from groups interested in practical applications of NSOM to
areas which are limited by conventional optical resolution. Areas of discussion
will
range from biology and clinical research to semiconductor technology and
materials science. All invited participants are keenly interested in developing
new areas of application for NSOM.
 
WHO SHOULD ATTEND
 
Because the workshop will aim to spark discussion of both exciting and novel
NSOM applications, anyone with any interest in Scanning Probe Microscopy or
anyone who would like to extend existing light-based studies to higher
resolution
should attend.
 
POSTER SESSION
 
Anyone with research in the field of NSOM or more general areas of Scanning
Probe Microscopy is encouraged to submit a poster. Display facilities will be
available during morning and afternoon breaks and during the lunch-time
discussion period.
 
HOW TO REGISTER
 
Please complete the registration form (page 6) and return it to TopoMetrix
Corporation in Santa Clara, California. This registration fee covers the full
day*s
attendance including eight speakers, lunch, and refreshments throughout the
workshop.
 
 
AGENDA
 
8:00 - Registration
8:45 - Welcome address by Professor Ronald Hanson, Department Chairman,
Department of Mechanical Engineering, Stanford University.
9:00 - Mark Utlaut, University of Portland - Introduction to Near-field Scanning
 
Optical Microscopy
9:30 - Philip Haydon, Iowa State University - Opportunities for Near-field
Microscopy in Biology
10:10 - Break
10:40 - Wolfgang Heckl, University of Munich - Scanning Probe Microscopy of
DNA from Molecules to Chromosomes
11:20 - Shyamsunder Erramilli, Boston University - Scanning Near-field Infrared
Microscope (SNIM) Based on a Free Electron Laser
12:00 - Lunch/Poster Session
1:30 - Kenneth Goodson, Stanford University - Laser Thermometry and Processing
in the Near-field
2:10 - Walter Duncan, Texas Instruments - Near-field Optical Spectroscopy of
Electronic Materials and Structures
2:50 - Break
3:20 - Nigel Cave, Motorola Corp. - Near-field Optical Microscopy and
Spectroscopy of
Semiconductors
4:00 - Ludwig Balk, University of Wuppertal, Germany - Device Characterization
and Failure Analysis by Means of Near-field Scanning Optical Microscopy
4:40 - Final Discussion
 
BIOGRAPHIES:
 
PROFESSOR LUDWIG BALK
Dr. Balk studied physics at the Technical University of Aachen, gaining his
diploma
in 1971, then his doctoral degree within the faculty of electrical engineering
in
1976. Following his move to Duisberg University as Academic Director in the
Department of Materials, Dr. Balk took a full chair professorship for
electronics in
the faculty of electrical engineering at the University of Wuppertal in 1991 and
is
presently dean of faculty. His applications range from pure electronic materials
to
inorganic materials, such as functional ceramics, and biological materials, such
as
human tissues and cells.
 
DR. NIGEL CAVE
Dr. Cave is a senior staff scientist in Material Research and Strategic
Technologies at
Motorola. He uses optical techniques to characterize new semiconductor materials
 
and processes. He is currently developing near-field optical techniques within
Motorola to permit deep sub-micron analysis of semiconductor devices. Dr. Cave
received his Ph.D. from Imperial College, London in 1990 and did his
post-doctoral
work at the University of Cincinnati.
 
DR. WALTER DUNCAN
Dr. Duncan is a senior member of the technical staff in the Materials Science
Laboratory of Texas Instruments. He received his B.S. in Chemistry from Virginia
 
Polytechnic Institute in 1974 and his Ph.D. in Inorganic Chemistry from North
Carolina State University in 1979. His current research is directed towards in
situ
wafer state sensors for adaptive control of vacuum processes, near-field optical
 
microscopy, optical properties of quantum confined structures, and silicon based
 
optoelectronic integrated circuits.
 
DR. SHYAMSUNDER ERRAMILLI
Dr. Erramilli is a professor in Photonics and Physics at Boston University,
granted a
joint appointment in 1996. He received his Ph.D in Physics from the University
of
Illinois working with Hans Frauenfelder. He later joined the faculty of the
Physics
department at Princeton University, where he taught for ten years. His research
interests have included the application of imaging techniques in Biological
Physics,
using x-ray diffraction and high pressure to study biological systems. Most
recently,
Dr. Erramilli has worked in the development of new forms of infrared microscopy.
 
In 1995, he was named a recipient of the duPont Young Professor award.
 
PROFESSOR KENNETH GOODSON
Dr. Goodson is a professor and Terman Fellow with the Mechanical Engineering
Department at Stanford University. He received a Ph.D. from M.I.T. in 1993 and
was visiting scientist for two years with Daimler-Benz AG. His research
investigates
thermal phenomena in semiconductor devices and interconnects for integrated
circuits. Dr. Goodson's group is using NSOM to improve the spatial resolution of
 
far-field optical thermometry and thermal processing techniques developed
previously in his laboratory. He is an Office of Naval Research Young
Investigator
and a recipient of the National Science Foundation CAREER Award.
 
PROFESSOR PHILIP HAYDON
Dr. Haydon is a professor and the director of the Signal Transduction Training
Group as well as the Laboratory of Cellular Signaling at Iowa State University.
His
research focuses on ion channels and synaptic trans-mission between neurons. He
is
applying AFM and NSOM techniques to these problems.
 
PROFESSOR WOLFGANG HECKL
Dr. Heckl is a professor in Experimental Physics at the University of Munich in
the
Institute for Crystallography & Mineralogy. Dr. Heckl gained his Physics diploma
at
Munich in 1985 followed by his Ph.D. in experimental physics under Professors
Moewald and Sackmann. Post-doctorate positions followed at the Max-Planck
Institute and the University of Toronto before working with Professor G. Binnig
at
IBM Research (STM) and Prof. T. Hansch at the Ludwig-Maximilians University
Munich (STM/SFM/NSOM).
 
PROFESSOR MARK UTLAUT
Dr. Utlaut is a professor in the Department of Chemistry and Physics at the
University of Portland where he pursues research in the applications of Focused
Ion
Beam and Secondary Ion Mass Spectrometry technology as well as NSOM
imaging. Dr. Utlaut received his B.S. in Physics from the University of Colorado
and
his Ph.D. in Physics from the University of Chicago.
 
 
REGISTRATION
HOW TO REGISTER
Complete the advanced registration form below and return with your check or
money order. Payment must be included in order to process your registration.
On-site registration will be available on a first-come, first-serve basis only.
All
workshop registrations received by October 10, 1996 will be confirmed. Badges
will
be available at the workshop registration area on the day of the workshop.
Registration begins at 8:00 a.m.
 
CANCELLATION AND REFUND POLICY
If you need to cancel for any reason, you must notify TopoMetrix Corporation, in
 
writing, by 5:00 p.m., October 15, 1996 to receive a full refund. Because the
tickets may sell out before the workshop, refunds will not be granted on
cancellations received after that date.
 
SPEAKER AVAILABILITY
The speakers listed in this brochure are leading professionals in their
respective
fields. Should a speaker be unable to attend the workshop, all efforts will be
made
to replace that speaker with one of comparable experience and qualifications.
 
WORKSHOP REGISTRATION:
FAX to:
408/982-9751
 
MAIL to:
TopoMetrix Corporation
Attention: Workshop Registration
5403 Betsy Ross Drive
Santa Clara, CA 95054
 
For Workshop Information call: 408/982-9700-Jan McNerney
 
COST:
Industry scientists, executives and academics: $50.00
Students, interns and lab technicians: $20.00
 
PLEASE SEND THE FOLLOWING INFORMATION:
 
First Name, Middle, Last Name
 
Title/Department, Company
 
Address
 
City, State/Prov, Zip/Postal Code
 
Phone, Facsimile
 
Registration must be payed before the Workshop.
 
Enter total payment due: $_____
 
Check or money order must be made payable to "TopoMetrix Corporation".
 
Regards,
 
 
Paul W. Green
Chairman
 
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